Toppan Photomask Signs Agreement with IBM for Joint R&D on Semiconductor EUV Photomasks
Advancing development of EUV photomasks for IBM’s 2 nanometer technology designs
TOKYO, Feb. 7, 2024 /PRNewswire/ — Toppan Photomask, the world’s premier semiconductor photomask provider, announced that it has e… อ่านเพิ่ม